谁知道雪莱《普罗米修斯赞歌》英文版的原文
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解决时间 2021-02-28 10:07
- 提问者网友:杀手的诗
- 2021-02-28 05:58
谁知道雪莱《普罗米修斯赞歌》英文版的原文
最佳答案
- 五星知识达人网友:封刀令
- 2021-02-28 06:54
TO —.
When passion’s trance is overpast,
If tenderness and truth could last,
Or live,whilst all wild feelings keep
Some mortal slumber,dark and deep,
I should not weep,I should not weep!
It were enough to feel,to see,
Thy soft eyes gazing tenderly,
And dream the rest—and burn and be
The secret food of fires unseen,
Couldst thou but be as thou hast been,
After the slumber of the year
The woodland violets reappear;
All things revive in field or grove,
And sky and sea,but two,which move
And form all others,life and love.
1821.
By Percy Bysshe Shelley
When passion’s trance is overpast,
If tenderness and truth could last,
Or live,whilst all wild feelings keep
Some mortal slumber,dark and deep,
I should not weep,I should not weep!
It were enough to feel,to see,
Thy soft eyes gazing tenderly,
And dream the rest—and burn and be
The secret food of fires unseen,
Couldst thou but be as thou hast been,
After the slumber of the year
The woodland violets reappear;
All things revive in field or grove,
And sky and sea,but two,which move
And form all others,life and love.
1821.
By Percy Bysshe Shelley
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- 1楼网友:北城痞子
- 2021-02-28 07:38
electron-assisted chemical etching of oxidized chromium, crox, has been studied by scanning electron microscopy (sem), energy dispersive spectroscopy (eds) and atomic force microscopy (afm). two model substrates were used-10 nm crox deposited on si(1 0 0) that was covered with either native oxide or a 20 nm au/pd alloy film. using chlorine and/or oxygen as etching gases, the experiments were conducted in a customized high vacuum system, equipped with a high density electron source and a low pressure reaction cell. on both substrates, electron-assisted chemical etching of cio(x) was detected by sem, eds and afm. making the method questionable for etching applications, there is substantial substrate damage associated with the etching. the sem images indicate strongly inhomogeneous material removal, apparently initiated and propagated from specific but unidentified sites. in the experiments involving the au/pd film, there was phase separation of au and pd, and dewetting to form metallic islands. afm data show that the etched holes were as deep as 200 nm, confirming relatively rapid etching of the si substrate after the top layer of cr oxide was removed. (c) 2005 elsevier b.v. all rights reserved.
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